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Intel's first commercial High-NA EUV lithography system installation at semiconductor fabrication facility
← Back to News 🔬 Tech News: Semiconductor Manufacturing

Intel Becomes First Company to Install ASML's Revolutionary High-NA EUV Lithography System

📅 4 February 2026 ⏱️ 3 min read ✍️ OnOff Team
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Intel became the first company to install ASML's High-NA EUV in commercial production. This machine costs $380 million and is a game changer for chips.

📖 Read more: SEMI: US Chip Priorities for 2026

0.55 NA
numerical aperture
$380M
machine cost
8nm
feature resolution
2nm
technology target

🔬 What Is EUV?

EUV (Extreme Ultraviolet) is the photolithography technology used to manufacture the most advanced chips in the world. It uses ultraviolet light with a wavelength of 13.5nm to “draw” microscopic patterns on silicon.

High-NA (high numerical aperture) increases precision from 0.33 to 0.55 NA. This enables features below 8nm — essential for 2nm technology and beyond.

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Intel First

Won the race against TSMC and Samsung for the first machine

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Made in EU

ASML (Netherlands) is the only company in the world that makes EUV machines

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1.7x Density

More transistors per square millimeter

Performance

Faster and more energy-efficient chips

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🏁 Why It Matters

Intel has lost ground in recent years to TSMC. The High-NA EUV is part of the company's “comeback” strategy. With it, Intel aims to become a leader in chip manufacturing again by 2027.

For Europe, this means ASML remains critical in the global semiconductor supply chain. No other company on the planet can build such machines.

🚫 China Locked Out

The US has banned the sale of EUV machines to China. This keeps Chinese manufacturers at least 5 years behind in chip technology.

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OnOff Tech

We track developments in the semiconductor industry and what they mean for the world.

Intel ASML High-NA EUV semiconductor lithography 2nm process chip manufacturing foundry technology